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Instruments and Methodologies for Accurate Metrology and Fleet Matching

Description

This course teaches the methodologies of total measurement uncertainty (TMU) analysis and fleet measurement precision (FMP) analysis. The course concentrates on the application of a general form of regression analysis (Mandel) to the applications of measurement tool matching, and measurement instrument assessment and optimization. Case studies will be selected from a collection of examples from measurement technologies such as CD-SEM, scatterometer, overlay, and CD-AFM. These examples will provide the seminar participants with the knowledge and tools necessary for conducting single tool and multiple tool assessments and optimizations. 

Learning Outcomes 

The course will enable you to: 
  • Design a metrology evaluation strategy for any application 
  • Determine the relative accuracy of a measurement specific to the target application 
  • Optimize measurement conditions and algorithm settings to minimize TMU 
  • Establish a matching methodology that quantifies fleet performance and provides valuable diagnostic information about individual tools

Intended audience 

This material is intended for anyone who needs to learn how to critically evaluate metrology instruments for accuracy, precision, and matching. Those who need to optimize metrology instruments with the right balance of precision and accuracy will find this course valuable. Those who are responsible for maintaining a well-matched fleet of metrology instruments will also find this metrology valuable. 

Course Level 

Intermediate 

Instructor 

Bill Banke is a former lead engineer at the IBM Microelectronics Division Measurement Standards Laboratory. The course is created by Bill Banke and Chas Archie. Chas Archie is a senior physicist at IBM Microelectronics Division Semiconductor Research and Development Center. He is a former chair of the SPIE Conference for Metrology, Inspection, and Process Control for Microlithography. 

Duration 

1/2 day (3.5-4 hours)