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Nanoscale Fabrication and Metrology: Leveraging on the Nature of Electrons and Ions

Description

This course provides attendees with an introductory working knowledge of nanoscale fabrication patterning techniques and metrology using scanning electron and ion microscopy probes.  The course begins with an overview of the properties of electrons, and the concepts of electron beam sample interaction.  For nanoscale fabrication and metrology we must learn to take full advantage of the nature of how electrons and ions are absorbed and reflected at the nanoscale. The course includes a hands on activity to visualize electron interaction and absorption using Monte Carlo electron scattering simulation software.   A comparison of the different types of electron and ion sources available for fabrication and metrology are presented. The principles of Scanning Electron Microscopy (SEM) and Focused Ion Beam (FIB) microscopy, and nanoscale fabrication techniques developed from them are reviewed.  The relative merits of additive and subtractive patterning techniques including Electron Beam Lithography (EBL), Electron and Ion Beam Induced Deposition (EBID and IBID), and Focused Ion Beam milling are compared. 

 

Learning outcomes

During this course you will learn:

·         The physical principles, merits and limitations of SEM and FIB patterning and metrology techniques

·         The relative benefits of the different types of available electron and ion sources

·         How to use Monte Carlo simulation to visualize electron and ion scattering in your material and how it relates to metrology and nanoscale fabrication

·         Interpretation of Monte Carlo electron scattering results to identify the best technique and probe energy needed for metrology and characterization of nanoscale devices and thin films

·         The basic principles of charged particle optics using Finite Element Modeling (FEM) and Computer Aided Design (CAD) to model electron flight through electrostatic and magnetic lens

·         How to apply these techniques using specific nanoscale device fabrication examples

 

Intended audience

This material is intended for anyone who wants to learn basics of some of the latest scanning beam methods used for rapid prototyping, and characterization of nanoscale devices. Those who either have a need to fabricate, and or perform metrology on nanoscale structures or who work with those who do will gain a basic understanding of the details of the processes.

 

Course level

Introductory

 

Course Length

One day (7hrs) or two days (3.5 hrs each day)

 

Instructor

The instructor of this course is an expert in materials characterization and nanoscale fabrication. He has 20 years of experience in Scanning Electron Microscopy (SEM), and in developing graduate level university coursework and seminars on the instrumentation and theory used in materials characterization. The instructor has more than 20 publications in developing scientific instruments for measurement of general physical and chemical properties of materials, and more specific materials characterization techniques used in nanofabrication and surface analysis. He holds a patent for a novel nondestructive materials characterization technique, and several records of invention for new materials characterization and nanoscale fabrication methods.