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Reference Metrology

Reference metrology is a key for achieving sub-nanometer measurement uncertainty (MU) of your patterning metrology. 

Today CDAFM (critical dimension atomic force microscope) is the most advanced reference metrology tool capable of sub-nanometer MU. 

Using reference metrology you can create SI-traceable set of "golden" samples which represent your technology, specific equipment and processes. 

The set of SI-traceable samples is used then to calibrate, match and tune in-line metrology tools. 

For further details please see Measurement System Analysis page